IMPORTANT: You need to contact [email protected] at least 24 hours before you want to use the system to allow warmup and chamber pumping. The Veeco Fiji gen2 is an atomic layer deposition system (ALD). It accommodates up to 8” substrates and is designed for pulsed or plasma gas flows. It has up to 6 precursor inputs and it can process using Argon, Nitrogen or Oxygen gases. It is possible to use hydrogen, but only on special request. It has a load lock that is pumped with a turbo pump, allowing fast pumping in the process chamber. The machine can operate in 3 modes: continuous Mode (traditional thermal ALD), Exposure Mode (High aspect ratio ALD) or Plasma mode (plasma-enhance ALD). The substrate can be heated up to 500 DegC. It acheives a deposition uniformity of 1.5%. It accomodates gas, liquid or solid precursors, individually heated up to 200 DegC, in a 50cc (25ml fill max) stainless steel cylinder.