The PDS 2010 is a vacuum system used for the vapor deposition of Parylene polymer onto a variety of substrates. The clear polymer coating provides an extremely effective chemical and moisture barrier and has a high dielectric constant and mechanical strength. The Parylene process sublimates a dimer into a gaseous monomer. The monomer then polymerizes at room temperature onto the substrate. At the vacuum levels used, all sides of the substrate are uniformly impinged by the gaseous monomer, resulting in a conformal coating. Key Features: – Wafer size: From small pieces up to 8” – Can load non-flat samples – Rotating Platter/sample holder – Rough Vacuum – Mechanical Chiller – Semi-Automatic Run Mode