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    Technoorg-Linda UniMill Broad Ion Beam Milling System
    Technoorg-Linda UniMill Broad Ion Beam Milling System 2
    EquipmentAvailable

    Technoorg-Linda UniMill Broad Ion Beam Milling System

    Faculty of Engineering
    Mining & Materials Engineering
    McGill University

    The Technoorg-Linda UniMill (Model IV7) is a versatile and fully automated ion beam thinning system designed for extremely rapid preparation of high-quality TEM/XTEM (Transmission Electron Microscopy/Cross-sectional Transmission Electron Microscopy) samples. It is particularly effective for achieving electron transparency on conductive specimens (e.g., 3 mm discs). The system features two independently controlled Ar+ ion sources: a high-energy gun (up to 16 keV, 500 μA) for fast thinning and a low-energy gun (100 eV - 2 keV, 7-80 μA) for final polishing and gentle cleaning of redeposited materials and amorphized layers, minimizing surface damage. The UniMill provides high beam current densities and is controlled by an easy-to-use graphical interface, allowing for storage and pre-programming of milling parameters including electrode voltages, gas flow, and sample motion/tilt. It offers sample cooling options (e.g., liquid nitrogen) for beam-sensitive specimens and features fast, motorized sample exchange via a load-lock system, which helps maintain vacuum levels and save time.

    McGill Electron Microscopy Research Group

    McGill Electron Microscopy Research Group

    Faculty of Engineering

    Research lab focused on advancing scientific knowledge and innovation.

    RG

    Raynald Gauvin

    EquipmentAvailable

    Technoorg-Linda UniMill Broad Ion Beam Milling System

    Faculty of Engineering
    Mining & Materials Engineering
    McGill University

    The Technoorg-Linda UniMill (Model IV7) is a versatile and fully automated ion beam thinning system designed for extremely rapid preparation of high-quality TEM/XTEM (Transmission Electron Microscopy/Cross-sectional Transmission Electron Microscopy) samples. It is particularly effective for achieving electron transparency on conductive specimens (e.g., 3 mm discs). The system features two independently controlled Ar+ ion sources: a high-energy gun (up to 16 keV, 500 μA) for fast thinning and a low-energy gun (100 eV - 2 keV, 7-80 μA) for final polishing and gentle cleaning of redeposited materials and amorphized layers, minimizing surface damage. The UniMill provides high beam current densities and is controlled by an easy-to-use graphical interface, allowing for storage and pre-programming of milling parameters including electrode voltages, gas flow, and sample motion/tilt. It offers sample cooling options (e.g., liquid nitrogen) for beam-sensitive specimens and features fast, motorized sample exchange via a load-lock system, which helps maintain vacuum levels and save time.

    Technoorg-Linda UniMill Broad Ion Beam Milling System
    Technoorg-Linda UniMill Broad Ion Beam Milling System 2
    McGill Electron Microscopy Research Group

    McGill Electron Microscopy Research Group

    Faculty of Engineering

    Research lab focused on advancing scientific knowledge and innovation.

    RG

    Raynald Gauvin

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    © 2026 LabGiant
    Privacy PolicyTerms of Service