The Nanoplus DSB6000 is an Oxygen Plasma Etching system primarily used for cleaning, resist stripping, and surface modification in micro- and nanofabrication. This tool employs reactive oxygen species generated in a plasma to chemically react with organic materials, converting them into volatile products that are then pumped away. It is highly effective for removing photoresist residues, organic contaminants, and for activating surfaces prior to subsequent deposition steps or bonding processes. Oxygen plasma etching is a critical step in many fabrication sequences, ensuring clean and well-prepared surfaces for optimal device performance.

Faculty of Science
Research lab focused on advancing scientific knowledge and innovation.
The Nanoplus DSB6000 is an Oxygen Plasma Etching system primarily used for cleaning, resist stripping, and surface modification in micro- and nanofabrication. This tool employs reactive oxygen species generated in a plasma to chemically react with organic materials, converting them into volatile products that are then pumped away. It is highly effective for removing photoresist residues, organic contaminants, and for activating surfaces prior to subsequent deposition steps or bonding processes. Oxygen plasma etching is a critical step in many fabrication sequences, ensuring clean and well-prepared surfaces for optimal device performance.

Faculty of Science
Research lab focused on advancing scientific knowledge and innovation.
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