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    Plasma Pod-RIE_ Plasma therm
    EquipmentAvailable

    Plasma Pod-RIE_ Plasma therm

    Faculté de génie
    École de technologie supérieure (ETS)

    The Plasma-Term model Plasma pad machine can be used as a plasma asher, to clean substrates or as an RIE (reactive ion etcher). the chamber can hold subtrates up to a diameter of 180mm (6 inches) and a height of 105mm (4.1 inches). For now only oxygen and argon are available. We will later have CF4.

    LaCIME - communications et microélectronique

    LaCIME - communications et microélectronique

    Faculté de génie

    Research lab focused on advancing scientific knowledge and innovation.

    MG

    Mathieu Gratuze

    Faculté de génie
    École de technologie supérieure (ETS)
    EquipmentAvailable

    Plasma Pod-RIE_ Plasma therm

    Faculté de génie
    École de technologie supérieure (ETS)

    The Plasma-Term model Plasma pad machine can be used as a plasma asher, to clean substrates or as an RIE (reactive ion etcher). the chamber can hold subtrates up to a diameter of 180mm (6 inches) and a height of 105mm (4.1 inches). For now only oxygen and argon are available. We will later have CF4.

    Plasma Pod-RIE_ Plasma therm
    LaCIME - communications et microélectronique

    LaCIME - communications et microélectronique

    Faculté de génie

    Research lab focused on advancing scientific knowledge and innovation.

    MG

    Mathieu Gratuze

    Faculté de génie
    École de technologie supérieure (ETS)

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    Research IndexTechniquesCommunityPlans

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    McGill UniversityConcordia UniversityUniversité de MontréalPolytechnique MontréalDobson Centre for EntrepreneurshipUniversity of Alberta
    © 2026 LabGiant
    EN|FR
    Privacy PolicyTerms of Service