
The Plasma-Term model Plasma pad machine can be used as a plasma asher, to clean substrates or as an RIE (reactive ion etcher). the chamber can hold subtrates up to a diameter of 180mm (6 inches) and a height of 105mm (4.1 inches). For now only oxygen and argon are available. We will later have CF4.

Faculté de génie
Research lab focused on advancing scientific knowledge and innovation.
The Plasma-Term model Plasma pad machine can be used as a plasma asher, to clean substrates or as an RIE (reactive ion etcher). the chamber can hold subtrates up to a diameter of 180mm (6 inches) and a height of 105mm (4.1 inches). For now only oxygen and argon are available. We will later have CF4.


Faculté de génie
Research lab focused on advancing scientific knowledge and innovation.
Discover more resources that could support your research