The Hitachi NX-5000 (Ethos) is a sophisticated dual-beam system that integrates a cold-field emission SEM column for nanometer-scale imaging with a liquid Ga FIB column. This combination allows for precise preparation of thin TEM lamellae and 3D reconstruction of material microstructures. It is equipped with an EDS/EBSD combo from Oxford Instruments for comprehensive elemental and crystallographic analysis. A Quorum cryo-system (PP3010T) is available for preparing soft materials. Additionally, the NX-5000 offers Ar+ milling with a third column, used for finishing surfaces after Ga milling, with milling energies of 1 or 2 kV. The SEM column provides a resolution of 1.5 nm at 1 kV and 0.7 nm at 15 kV, with a probe current ranging from 5 pA to 10 nA, and accelerating voltages from 0.1 to 30 kV. It includes SE/BSE in-lens detectors (SE(U), BSE(U), BSE(L)) and an in-chamber SE detector (SE(L)). The Ga liquid metal ion source delivers a maximum FIB probe current of 100 nA and a FIB resolution of 4 nm at 30 kV and 60 nm at 2 kV.