EquipmentAvailable
Picomaster100- lithography exposure machine
Faculté de génie
École de technologie supérieure (ETS)
Located in MEMS cleanroom A2543, the Picomaster 100 is a UV direct laser writer for maskless lithography. 405nm laser diode. Min 0.3um feature size. 4095 levels of greyscale. Spotsize of 0.3, 0.6 and 0.9um. Exposable area 100mm. Max substrate size 125mm, min 5mm. Max speed 200mm/s.
LaCIME - communications et microélectronique
Faculté de génie
Research lab focused on advancing scientific knowledge and innovation.
MG
Mathieu Gratuze
Faculté de génie
École de technologie supérieure (ETS)
EquipmentAvailable
Picomaster100- lithography exposure machine
Faculté de génie
École de technologie supérieure (ETS)
Located in MEMS cleanroom A2543, the Picomaster 100 is a UV direct laser writer for maskless lithography. 405nm laser diode. Min 0.3um feature size. 4095 levels of greyscale. Spotsize of 0.3, 0.6 and 0.9um. Exposable area 100mm. Max substrate size 125mm, min 5mm. Max speed 200mm/s.
LaCIME - communications et microélectronique
Faculté de génie
Research lab focused on advancing scientific knowledge and innovation.
MG
Mathieu Gratuze
Faculté de génie
École de technologie supérieure (ETS)
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