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    EquipmentAvailable

    Veeco ME 1001 ion beam milling system

    Argon ion beam milling for microelectronics patterning, with a water-cooled substrate holder for wafers up to 200 mm.

    US$50 to US$121 / hourAll ratesView pricing

     

    The instrument

    Argon plasma ion beam milling for microelectronics patterning. The water-cooled substrate holder takes wafers up to 200 mm.

    Rates

    Boise State researchers
    US$50 / hour
    Commercial
    US$121 / hour
    Everyone else
    US$71 / hour

    View pricing

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    LabGiant,

    Features

    Equipment CalendarProtocol CortexCRMImpact Reporting

    Explore

    Research IndexTechniquesCommunityPlans

    In partnership with

    McGill UniversityConcordia UniversityUniversité de MontréalPolytechnique MontréalDobson Centre for EntrepreneurshipUniversity of Alberta
    © 2026 LabGiant
    EN|FR
    Privacy PolicyTerms of Service