Atomic Layer Deposition (ALD) system for chemical vapor deposition. Available materials include: TiO2, Al2O3, SiO2, HfO2.

Faculty of Science
Research lab focused on advancing scientific knowledge and innovation.
Atomic Layer Deposition (ALD) system for chemical vapor deposition. Available materials include: TiO2, Al2O3, SiO2, HfO2.

Faculty of Science
Research lab focused on advancing scientific knowledge and innovation.
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