The FEI Helios Nanolab 660 DualBeam is an advanced Focused Ion Beam - Extreme High-Resolution Scanning Electron Microscope (FIB-XHR SEM) designed for nanoscale imaging, precise sample modification, and high-resolution structural analysis. With its DualBeam capability, this system seamlessly integrates FIB milling and SEM imaging, making it ideal for materials science, semiconductor research, and cryo-electron microscopy (Cryo-EM) sample preparation.

Key Features:

✅ Leica Microsystems EM VCT500 Cryo-Transfer System – Enables cryo-FIB/SEM workflows for sensitive biological and soft-matter samples.

✅ MultiChem Gas Injection System – Facilitates site-specific material deposition and etching for advanced nanofabrication applications.

✅ EDAX Octane Ultra (100 mm² SDD) – Large-area Silicon Drift Detector (SDD) for high-throughput energy-dispersive X-ray spectroscopy (EDS).

✅ TEAM 3D EDS Analysis System – Advanced software suite for high-resolution elemental mapping and 3D compositional analysis.

✅ Extreme High-Resolution SEM – Industry-leading imaging quality for ultra-fine structural characterization.

This system is well-suited for researchers in nanotechnology, materials characterization, and microelectronics.