The Hitachi High-Technologies Ethos NX5000 is a cutting-edge Focused Ion and Electron Beam (FIB-SEM) system, designed for high-precision micro- and nanofabrication, site-specific sample preparation, and advanced analytical characterization. This dual-beam system integrates ion and electron optics for seamless imaging, milling, and analysis of a wide range of materials, making it ideal for semiconductor research, materials science, and failure analysis.

Key Features:

✅ Dual-Beam System – Combines focused ion beam (FIB) and scanning electron microscopy (SEM) for high-precision imaging and microstructuring.

✅ Oxford Instruments Ultim Max SDD – Large-area silicon drift detector (SDD) for high-throughput Energy Dispersive X-ray Spectroscopy (EDS).

✅ AZtec 3D EDS – Advanced software suite for three-dimensional elemental mapping and in-depth compositional analysis.

✅ AZtecCrystal EBSD – Electron Backscatter Diffraction (EBSD) system for detailed crystallographic characterization.

This system is ideal for researchers requiring precise nanofabrication, high-resolution imaging, and advanced material characterization.