Translated from French
Advanced Plasma Source (APS)-assisted electron-beam evaporation with in situ optical thickness monitoring, for stacks of up to 100 oxide and silica layers.
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This is one of our two primary deposition systems, alongside the Intlvac Nanochrome. An Advanced Plasma Source (APS) assists the electron-beam evaporation. In situ optical monitoring (400 to 2500 nm) tracks each layer's thickness for stacks of up to 100 layers: dielectric mirrors, anti-reflective coatings, filters, and dichroic beam splitters.
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