Benchtop rapid thermal processing with multiple gases for wafers up to 6 inches: implant activation, contact alloying and silicide formation.
US$25 to US$86 / hourAll ratesView pricing
The RTP-600S is a benchtop rapid thermal processing system with multi-gas capability and graphite tooling. It processes wafers up to 6 inches in diameter, for implant activation, contact alloying and silicide formation.
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