Fluorine-based reactive ion etching with a load lock and 100 mm tooling, for Bosch and cryogenic silicon etch, oxide, nitride and metal etch.
US$60 to US$135 / hourAll ratesView pricing
Reactive ion etching (RIE) using fluorine-based gases, with 100 mm tooling and a load lock.
Process capabilities: Bosch etch, silicon cryo-etch, silicon dioxide (SiO2) etch, silicon nitride (Si3N4) etch and metal etch.
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